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Proceedings Paper

Multi-trigger resist for electron beam lithography
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Paper Abstract

Irresistible Materials is developing a new molecular resist system that demonstrates high-resolution capability based on the Multi-trigger concept. In a Multi-Trigger resist, multiple distinct chemical reactions in chemical amplification process must take place in close proximity simultaneously during resist exposure. Thus, at the edge of a pattern feature, where the density of photo-initiators that drive the chemical reactions is low, the amplification process ceases. This significantly reduces blurring effects and enables much improved resolution and line edge roughness while maintaining the sensitivity advantages of chemical amplification. A series of studies such as enhanced resist crosslinking, elimination of the nucleophilic quencher and the addition of high-Z additives to e-beam resist (as a means to increase sensitivity and modify secondary electron blur) were conducted in order to optimize the performance of this material. The optimized conditions allowed patterning down to 28 nm pitch lines with a dose of 248 μC/cm2 using 100kV e-beam lithography, demonstrating the potential of the concept. Furthermore, it was possible to pattern 26 nm diameter pillars on a 60 nm pitch with dose of 221μC/cm2 with a line edge roughness of 2.3 nm.

Paper Details

Date Published: 28 September 2017
PDF: 9 pages
Proc. SPIE 10446, 33rd European Mask and Lithography Conference, 1044608 (28 September 2017);
Show Author Affiliations
Carmen Popescu, The Univ. of Birmingham (United Kingdom)
Alexandra McClelland, Irresistible Materials Ltd. (United Kingdom)
Guy Dawson, The Univ. of Birmingham (United Kingdom)
John Roth, Nano-C, Inc. (United States)
Dimitrios Kazazis, Paul Scherrer Institute (Switzerland)
Yasin Ekinci, Paul Scherrer Institute (Switzerland)
Wolfgang Theis, The Univ. of Birmingham (United Kingdom)
Alex P. G. Robinson, The Univ. of Birmingham (United Kingdom)
Irresistable Materials Ltd. (United Kingdom)

Published in SPIE Proceedings Vol. 10446:
33rd European Mask and Lithography Conference
Uwe F.W. Behringer; Jo Finders, Editor(s)

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