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Proceedings Paper

Depth-profiling of vertical material contrast after VUV exposure for contact-free polishing of 3D polymer micro-optics
Author(s): R. Kirchner; R. Hoekstra; N. Chidambaram; H. Schift
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Paper Abstract

We characterize the impact of high-energy, 172 nm vacuum ultraviolet photons on the molecular weight and the glass transition temperature of poly(methyl methacrylate). We found that the molecular weight is reduced strongly on the surface of the exposed samples with a continuous transition towards the unexposed bulk material being located below the modified region. The glass transition temperature was found to be significantly lowered in the exposed region to well below 50°C compared to that of the 122°C of the bulk region. We could use this material contrast to selectively reflow the top surface of the exposed samples only. This allowed us to create ultra-smooth micro-optical structures by post-processing without influencing the overall geometry that is required for the optical functionality.

Paper Details

Date Published: 28 September 2017
PDF: 8 pages
Proc. SPIE 10446, 33rd European Mask and Lithography Conference, 1044613 (28 September 2017);
Show Author Affiliations
R. Kirchner, Technische Univ. Dresden (Germany)
R. Hoekstra, Paul Scherrer Institute (Switzerland)
N. Chidambaram, Paul Scherrer Institute (Switzerland)
H. Schift, Paul Scherrer Institute (Switzerland)

Published in SPIE Proceedings Vol. 10446:
33rd European Mask and Lithography Conference
Uwe F.W. Behringer; Jo Finders, Editor(s)

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