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Proceedings Paper

Influence of the pellicle for FPD for i-line single wavelength exposure
Author(s): Kimiyuki Maruyama; Sadayuki Hirayama; Kohei Yano; Takashi Fujikawa; Masakatsu Hirano; Tatsunori Nakahara; Yuji Maruyama; Noriko Tani
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Paper Abstract

The miniaturization technology of the FPD panel have been advanced continuously, and it is said that the reducing rate is about 0.7 times for three years. Therefore, an exposure equipment of the 1.5 μm resolution was released from manufacturers in 2016. As one of some methods to realize 1.5 μm resolution, change from the broadband light to i-line single wavelength light has been selected. However, it is known that CD uniformity is become large, when a conventional pellicle is used in i-line single wavelength exposure[1]. Therefore, it is needed products suitable for i-line single wavelength exposure. In this paper, influence of the pellicle is investigated between conventional pellicle and i-line pellicle. Keywords:FPD, pellicle, i-line, resolution, CD uniformity.

Paper Details

Date Published: 13 July 2017
PDF: 9 pages
Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 1045403 (13 July 2017); doi: 10.1117/12.2279552
Show Author Affiliations
Kimiyuki Maruyama, Asahi KASEI Corp. (Japan)
Sadayuki Hirayama, Asahi KASEI Corp. (Japan)
Kohei Yano, Asahi KASEI Corp. (Japan)
Takashi Fujikawa, Asahi KASEI Corp. (Japan)
Masakatsu Hirano, Asahi KASEI Corp. (Japan)
Tatsunori Nakahara, Asahi KASEI Corp. (Japan)
Yuji Maruyama, Asahi KASEI Corp. (Japan)
Noriko Tani, Asahi KASEI Corp. (Japan)


Published in SPIE Proceedings Vol. 10454:
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
Kiwamu Takehisa, Editor(s)

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