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Proceedings Paper

Metrology of variable-line-spacing x-ray gratings using the APS Long Trace Profiler
Author(s): Janet Sheung; Jun Qian; Joseph Sullivan; Muriel Thomasset; Jonathan Manton; Sunil Bean; Peter Takacs; Joseph Dvorak; Lahsen Assoufid
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Paper Abstract

As resolving power targets have increased with each generation of beamlines commissioned in synchrotron radiation facilities worldwide, diffraction gratings are quickly becoming crucial optical components for meeting performance targets. However, the metrology of variable-line-spacing (VLS) gratings for high resolution beamlines is not widespread; in particular, no metrology facility at any US DOE facility is currently equipped to fully characterize such gratings. To begin to address this issue, the Optics Group at the Advanced Photon Source at Argonne, in collaboration with SOLEIL and with support from Brookhaven National Laboratory (BNL), has developed an alternative beam path addition to the Long Trace Profiler (LTP) at Argonne’s Advanced Photon Source. This significantly expands the functionality of the LTP not only to measure mirrors surface slope profile at normal incidence, but also to characterize the groove density of VLS diffraction gratings in the Littrow incidence up to 79°, which covers virtually all diffraction gratings used at synchrotrons in the first order. The LTP light source is a 20mW HeNe laser, which yields enough signal for diffraction measurements to be performed on low angle blazed gratings optimized for soft X-ray wavelengths. We will present the design of the beam path, technical requirements for the optomechanics, and our data analysis procedure. Finally, we discuss challenges still to be overcome and potential limitations with use of the LTP to perform metrology on diffraction gratings.

Paper Details

Date Published: 7 September 2017
PDF: 16 pages
Proc. SPIE 10385, Advances in Metrology for X-Ray and EUV Optics VII, 1038508 (7 September 2017);
Show Author Affiliations
Janet Sheung, Argonne National Lab. (United States)
Univ. of Illinois at Urbana-Champaign (United States)
Jun Qian, Argonne National Lab. (United States)
Joseph Sullivan, Argonne National Lab. (United States)
Muriel Thomasset, Synchrotron SOLEIL (France)
Jonathan Manton, Inprentus, Inc. (United States)
Sunil Bean, Argonne National Lab. (United States)
Peter Takacs, Brookhaven National Lab. (United States)
Joseph Dvorak, Brookhaven National Lab. (United States)
Lahsen Assoufid, Argonne National Lab. (United States)


Published in SPIE Proceedings Vol. 10385:
Advances in Metrology for X-Ray and EUV Optics VII
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)

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