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Proceedings Paper

Old and new techniques mixed up into optical photomask measurement method
Author(s): Jumpei Fukui; Yusaku Tachibana; Makoto Osanai
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Paper Abstract

It has been still highly required for cost efficient solution with easy operation for full-automated CD measurement for line width about 500nm up to 5μm on photomask, because it is frequently use such photomask in the process of manufacturing MEMS sensor for IoT and some devices made in BCD (Bipola CMOS DMOS). As reply to such demand in photomask manufacturing field, we try to take a low noise digital camera technology and LED light source for i-line, which are recently developed, into new measuring tool in order to achieve 1nm (3σ) repeatability for line width measurement between 300nm to 10μm. In addition, for the purpose of full-automated operation, it is very important to find where an initial target line in dense pattern. To achieve such auto line detection precisely, we have improved accuracy of high precision stage (20nm as 3σ) and an alignment algorithm of MEMS Stepper to combine with this tool. As for user-friendly interface, Windows based software helps a lot for not only the operation but also recipe creation or edition in Excel. Actually, in the MEMS manufacturing process, there are various photomasks which need to be check and measure frequently therefore various recipe files are also have to be created and edited frequently.. In order to meet such a requirement in photomask management, we try to make it true by mixing old and new techniques together into one system, which comes to fully automated and cost efficient tool with 1nm repeatability in CD measurement.

Paper Details

Date Published: 13 July 2017
PDF: 5 pages
Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540W (13 July 2017);
Show Author Affiliations
Jumpei Fukui, Nikon Engineering Co., Ltd. (Japan)
Yusaku Tachibana, Nikon Engineering Co., Ltd. (Japan)
Makoto Osanai, Nikon Engineering Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 10454:
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
Kiwamu Takehisa, Editor(s)

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