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Proceedings Paper

Application of advanced structure to multi-tone mask for FPD process
Author(s): Jin-Han Song; Jin-Woong Jeong; Kyu-Sik Kim; Woo-Gun Jeong; Sang-Pil Yun; Dong-Heok Lee; Sang-Soo Choi
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Paper Abstract

In accordance with improvement of FPD technology, masks such as phase shift mask (PSM) and multi-tone mask (MTM) for a particular purpose also have been developed. Above all, the MTM consisted of more than tri-tone transmittance has a substantial advantage which enables to reduce the number of mask demand in FPD fabrication process contrast to normal mask of two-tone transmittance.[1,2] A chromium (Cr)-based MTM (Typically top type) is being widely employed because of convenience of etch process caused by its only Cr-based structure consisted of Cr absorber layer and Cr half-tone layer. However, the top type of Cr-based MTM demands two Cr sputtering processes after each layer etching process and writing process. For this reason, a different material from the Cr-based MTM is required for reduction of mask fabrication time and cost. In this study, we evaluate a MTM which has a structure combined Cr with molybdenum silicide (MoSi) to resolve the issues mentioned above. The MoSi which is demonstrated by integrated circuit (IC) process is a suitable material for MTM evaluation. This structure could realize multi-transmittance in common with the Cr-based MTM. Moreover, it enables to reduce the number of sputtering process. We investigate a optimized structure upon consideration of productivity along with performance such as critical dimension (CD) variation and transmittance range of each structure. The transmittance is targeted at h-line wavelength (405 nm) in the evaluation. Compared with Cr-based MTM, the performances of all Cr-/MoSi-based MTMs are considered.

Paper Details

Date Published: 13 July 2017
PDF: 6 pages
Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540Z (13 July 2017); doi: 10.1117/12.2278714
Show Author Affiliations
Jin-Han Song, Photronics-PKL (Korea, Republic of)
Jin-Woong Jeong, Photronics-PKL (Korea, Republic of)
Kyu-Sik Kim, Photronics-PKL (Korea, Republic of)
Woo-Gun Jeong, Photronics-PKL (Korea, Republic of)
Sang-Pil Yun, Photronics-PKL (Korea, Republic of)
Dong-Heok Lee, Photronics-PKL (Korea, Republic of)
Sang-Soo Choi, Photronics-PKL (Korea, Republic of)

Published in SPIE Proceedings Vol. 10454:
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
Kiwamu Takehisa, Editor(s)

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