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Proceedings Paper

Cycle time reduction by Html report in mask checking flow
Author(s): Jian-Cheng Chen; Min-Ying Lu; Xiang Fang; Ming-Feng Shen; Shou-Yuan Ma; Chuen-Huei Yang; Joe Tsai; Rachel Lee; Erwin Deng; Ling-Chieh Lin; Hung-Yueh Liao; Jenny Tsai; Amanda Bowhill; Hien Vu; Gordon Russell
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Paper Abstract

The Mask Data Correctness Check (MDCC) is a reticle-level, multi-layer DRC-like check evolved from mask rule check (MRC). The MDCC uses extended job deck (EJB) to achieve mask composition and to perform a detailed check for positioning and integrity of each component of the reticle. Different design patterns on the mask will be mapped to different layers. Therefore, users may be able to review the whole reticle and check the interactions between different designs before the final mask pattern file is available. However, many types of MDCC check results, such as errors from overlapping patterns usually have very large and complex-shaped highlighted areas covering the boundary of the design. Users have to load the result OASIS file and overlap it to the original database that was assembled in MDCC process on a layout viewer, then search for the details of the check results. We introduce a quick result-reviewing method based on an html format report generated by Calibre® RVE. In the report generation process, we analyze and extract the essential part of result OASIS file to a result database (RDB) file by standard verification rule format (SVRF) commands. Calibre® RVE automatically loads the assembled reticle pattern and generates screen shots of these check results. All the processes are automatically triggered just after the MDCC process finishes. Users just have to open the html report to get the information they need: for example, check summary, captured images of results and their coordinates.

Paper Details

Date Published: 13 July 2017
PDF: 4 pages
Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 104540G (13 July 2017); doi: 10.1117/12.2278691
Show Author Affiliations
Jian-Cheng Chen, United Microelectronics Corp. (Taiwan)
Min-Ying Lu, Mentor Graphics Corp. (Taiwan)
Xiang Fang, Mentor Graphics Corp. (Taiwan)
Ming-Feng Shen, Mentor Graphics Corp. (Taiwan)
Shou-Yuan Ma, Mentor Graphics Corp. (Taiwan)
Chuen-Huei Yang, United Microelectronics Corp. (Taiwan)
Joe Tsai, United Microelectronics Corp. (Taiwan)
Rachel Lee, United Microelectronics Corp. (Taiwan)
Erwin Deng, United Microelectronics Corp. (Taiwan)
Ling-Chieh Lin, Mentor Graphics Corp. (Taiwan)
Hung-Yueh Liao, Mentor Graphics Corp. (Taiwan)
Jenny Tsai, Mentor Graphics Corp. (United States)
Amanda Bowhill, Mentor Graphics Corp. (United States)
Hien Vu, Mentor Graphics Corp. (United States)
Gordon Russell, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 10454:
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
Kiwamu Takehisa, Editor(s)

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