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Proceedings Paper

Research on fabrication of resist mold patterns for electroplating
Author(s): Kouta Shimizu; Yuhto Nishida; Toshiyuki Horiuchi
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Paper Abstract

Printing of thick resist patterns with a high aspect ratio and vertical side walls was investigated. Such resist patterns are required for using as molds of electroplating, and patterning feasibility in a small field of 2 mm square was verified in the past researches. However, it is necessary to print patterns homogeneously in an exposure field with a practical size of larger than 10 mm square, for example. As profiles of resist patterns for the use of electroplating molds, rectangular cross-sections are preferable. For this reason, patterns were printed in the negative resist SU-8 with a thickness of 50 μm using an exposure system with a field size of 15 mm square. Before using the thick SU-8, the best focus position of the exposure system was investigated. To find out the best focus position, line and space (LS) patterns were printed using a positive resist OFPR-800 with a thickness of approximately 1 μm. The focus position where patterns were most clearly formed on the wafer was decided to be the focus origin, and defocuses were controlled by moving wafers downward. Next, 50-μm LS patterns were printed in 50-μm thick SU-8. As a result, LS patterns with rectangular cross sections and a height of 40 μm were obtained when the defocus and the exposure time were set at 2000 μm and for 70 seconds, respectively. It was demonstrated that patterns with rectangular cross sections were printed in 3x5 mm2 exposure fields.

Paper Details

Date Published: 13 July 2017
PDF: 6 pages
Proc. SPIE 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, 1045412 (13 July 2017); doi: 10.1117/12.2277819
Show Author Affiliations
Kouta Shimizu, Tokyo Denki Univ. (Japan)
Yuhto Nishida, Tokyo Denki Univ. (Japan)
Toshiyuki Horiuchi, Tokyo Denki Univ. (Japan)


Published in SPIE Proceedings Vol. 10454:
Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
Kiwamu Takehisa, Editor(s)

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