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Proceedings Paper

Direct formation of nanostructures by focused electron beam on a surface of thin metallic films
Author(s): Janis Snikeris; Vjaceslavs Gerbreders
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Paper Abstract

This paper describes a method, which allows obtaining metallic nanostructures (MN) by focused electron beam irradiation in scanning electron microscope (SEM) in one fabrication step and without the use of additional chemicals. MN-nanodots were obtained by 30kV SEM on surfaces of various metallic thin films (Al, Cr, Cu, Mo, Ag). The thin films were prepared by direct current magnetron sputtering on Si substrate with 500 nm thickness. The size and shape of the obtained MN were measured with atomic force microscope. The height of the nanodots was up to 500 nm and their width at half height was in a range from 100 to 500 nm. The size of the obtained MN depends on the parameters of electron beam and properties of the metal. Possible mechanisms of MN forming under the influence of focused electron beam are discussed.

Paper Details

Date Published: 22 August 2017
PDF: 6 pages
Proc. SPIE 10453, Third International Conference on Applications of Optics and Photonics, 104532B (22 August 2017); doi: 10.1117/12.2275961
Show Author Affiliations
Janis Snikeris, Daugavpils Univ. (Latvia)
Vjaceslavs Gerbreders, Daugavpils Univ. (Latvia)


Published in SPIE Proceedings Vol. 10453:
Third International Conference on Applications of Optics and Photonics
Manuel Filipe P. C. M. Martins Costa, Editor(s)

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