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Proceedings Paper

Status of the metrology laboratory for the LCLS II project (Conference Presentation)

Paper Abstract

Along with the demanding requirements for the extreme limit pushing LCLS II project, comes the challenge in metrology work for qualifying the optical and mechanical components. Besides qualifying the components against specifications, it is also crucial to study performance, repeatability and stability of the mirror systems designed for meeting the LCLS II conditions. Therefore a dedicated metrology laboratory has been jointly funded by LCLS II project and LCLS facility. The laboratory, located close to the experimental hall of LCLS, is currently equipped with a 6” Fizaeau interferometer (Zygo DynaFiz) and a Zygo NewView 8300 white light interferometer. A profilometer, hosting a Long Trace Profiler optic head, an autocollimator (Moller Wedel) and a Shack Hartman head (SHArPer, Imagine Optics), is under assembling. The combination of these instruments will enable us to measure spatial periods from the µm scale up to 1.5 m. Further implementation in progress are the implementation of a stitching method for the 6” interferometer and reduction of environmental noise. The results obtained from measuring 1-m long flat mirrors, with sub-nm shape errors, produced by Jtec, show a very high sensitivity of the interferometer. These results, as well as the results obtained in testing the bender prototype and some diffraction gratings, will be presented.

Paper Details

Date Published: 3 October 2017
Proc. SPIE 10385, Advances in Metrology for X-Ray and EUV Optics VII, 103850E (3 October 2017); doi: 10.1117/12.2275562
Show Author Affiliations
May Ling Ng, SLAC National Accelerator Lab. (United States)
Corey L. Hardin, SLAC National Accelerator Lab. (United States)
Josep Nicolas, SLAC National Accelerator Lab. (United States)
Daniele Cocco, SLAC National Accelerator Lab. (United States)

Published in SPIE Proceedings Vol. 10385:
Advances in Metrology for X-Ray and EUV Optics VII
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)

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