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Proceedings Paper

Surface slope metrology of highly curved x-ray optics with an interferometric microscope
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Paper Abstract

The development of deterministic polishing techniques has given rise to vendors that manufacture high quality threedimensional x-ray optics. The surface metrology on these optics remains a difficult task. For the fabrication, vendors usually use unique surface metrology tools, generally developed on site, that are not available in the optical metrology labs at x-ray facilities. At the Advanced Light Source X-Ray Optics Laboratory, we have developed a rather straightforward interferometric-microscopy-based procedure capable of sub microradian characterization of sagittal slope variation of x-ray optics for two-dimensionally focusing and collimating (such as ellipsoids, paraboloids, etc.). In the paper, we provide the mathematical foundation of the procedure and describe the related instrument calibration. We also present analytical expression describing the ideal surface shape in the sagittal direction of a spheroid specified by the conjugate parameters of the optic’s beamline application. The expression is useful when analyzing data obtained with such optics. The high efficiency of the developed measurement and data analysis procedures is demonstrated in results of measurements with a number of x-ray optics with sagittal radius of curvature between 56 mm and 480 mm. We also discuss potential areas of further improvement.

Paper Details

Date Published: 7 September 2017
PDF: 10 pages
Proc. SPIE 10385, Advances in Metrology for X-Ray and EUV Optics VII, 103850H (7 September 2017);
Show Author Affiliations
Gevork S. Gevorkyan, Lawrence Berkeley National Lab. (United States)
Gary Centers, Lawrence Berkeley National Lab. (United States)
Helmholtz-Institut Mainz (Germany)
Kateryna S. Polonska, Lawrence Berkeley National Lab. (Ukraine)
Yuriy Fedkovych Chernivtsi National Univ. (Ukraine)
Sergey M. Nikitin, Lawrence Berkeley National Lab. (United States)
Ian Lacey, Lawrence Berkeley National Lab. (United States)
Valeriy V. Yashchuk, Lawrence Berkeley National Lab. (United States)

Published in SPIE Proceedings Vol. 10385:
Advances in Metrology for X-Ray and EUV Optics VII
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)

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