Recently, several upgraded ESRF beamlines have become operational. Some of them include Double Multilayer Monochromators (DMM) to reduce the heat load on downstream optics or to benefit from increased flux compared to crystal optics. In some cases the bandwidth of the DMM has to stay below 0.5%. Such multilayers require an elevated number of layers, materials with moderate electron density, and a coating uniformity close to 0.1%. These boundary conditions impose severe constraints on the performance of the deposition system. This work will highlight successful results and discuss persisting issues and potential approaches for technical improvements.

Date Published: 23 August 2017
PDF: 6 pages
Proc. SPIE 10386, Advances in X-Ray/EUV Optics and Components XII, 1038603 (23 August 2017); doi: 10.1117/12.2273609

Published in SPIE Proceedings Vol. 10386:
Advances in X-Ray/EUV Optics and Components XII
Christian Morawe; Ali M. Khounsary; Shunji Goto, Editor(s)