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Proceedings Paper

Current status of the hard x-ray nanoprobe beamline at the SSRF
Author(s): Aiguo Li; Hui Jiang; Hua Wang; Zhaohong Zhang; Yan He; Gaofeng Zhao; Deming Shu
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Paper Abstract

The hard X-ray nanoprobe beamline (HXN) designed at the Shanghai Synchrotron Radiation facility (SSRF) will be of capability to realize a focal spot size of 10 nm for hard X-rays to satisfy requirements in biology, environmental, material sciences and etc.. The beamline includes two modes of operation, high energy resolution mode and high flux mode respectively. High flux mode utilizes the multilayer KB system to obtain high-flux diffraction-limited focusing of ~10nm. An ultra-high-precision figure fabrication for diffraction-limited focusing is required to meet the Rayleigh Criterion. An idea to overcome this problem is to introduce a phase compensator upstream of the KB system to compensate the wavefront errors in the beamline. At wavelength speckle-based method will be used to measure the wavefront error in the beamline and feedback to the phase compensator. Vibration measurements have been carried out at the secondary source and endstation hutch. The flexure hinge mechanisms and high-precision actuators ensure the KB system and sample manipulator working with high stability. The building of HXN has been designed and is under construction at present.

Paper Details

Date Published: 7 September 2017
PDF: 9 pages
Proc. SPIE 10389, X-Ray Nanoimaging: Instruments and Methods III, 103890J (7 September 2017); doi: 10.1117/12.2273518
Show Author Affiliations
Aiguo Li, Shanghai Institute of Applied Physics (China)
Hui Jiang, Shanghai Institute of Applied Physics (China)
Hua Wang, Shanghai Institute of Applied Physics (China)
Zhaohong Zhang, Shanghai Institute of Applied Physics (China)
Yan He, Shanghai Institute of Applied Physics (China)
Gaofeng Zhao, Shanghai Institute of Applied Physics (China)
Deming Shu, Argonne National Lab. (United States)

Published in SPIE Proceedings Vol. 10389:
X-Ray Nanoimaging: Instruments and Methods III
Barry Lai; Andrea Somogyi, Editor(s)

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