Proceedings Paper
Metrology of semiconductor structures using novel Fabry Perot fringe stretching system| Format | Member Price | Non-Member Price |
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Paper Abstract
We describe patent pending fiber optic apparatus for measurements of thicknesses and distance employing low resolution spectrometer and etalon. The application of an additional known reference etalon "stretches fringes" and allows us to use Fabry Perot interference to investigate thick samples and large distances which would not be possible when using the low resolution spectrometer alone.
Paper Details
Date Published: 23 August 2017
PDF: 10 pages
Proc. SPIE 10373, Applied Optical Metrology II, 103730N (23 August 2017); doi: 10.1117/12.2273359
Published in SPIE Proceedings Vol. 10373:
Applied Optical Metrology II
Erik Novak; James D. Trolinger, Editor(s)
PDF: 10 pages
Proc. SPIE 10373, Applied Optical Metrology II, 103730N (23 August 2017); doi: 10.1117/12.2273359
Show Author Affiliations
Wojtek J. Walecki, Frontier Semiconductor, Inc. (United States)
Alexander Pravdivtsev, Frontier Semiconductor, Inc. (United States)
Published in SPIE Proceedings Vol. 10373:
Applied Optical Metrology II
Erik Novak; James D. Trolinger, Editor(s)
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