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Proceedings Paper

High resolution patterning of ultraviolet cross-linked resins using gas permeable mold derived from cellulose in nanoimprint lithography
Author(s): Shinya Nakajima; Satoshi Takei; Makoto Hanabata; Naoto Sugino; Takao Kameda; Yoko Matsumoto; Atsushi Sekiguchi
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Paper Abstract

A cellulose-based gas permeable mold having thermal crosslinking group for nanoimprint lithography has been developed to prevent transcriptional defects by volatile solvents from nanoimprinting materials. 3 wt.% of thermal initiator was required for producing the cellulose-based gas permeable mold. The void on 10 μm line structure of imprinted UV crosslinked resin with acetone as volatile solvents in nanoimprint lithography process using non-gas permeable mold was significantly removed using the cellulose-based gas permeable mold due to its high oxygen gas permeability. The cellulosebased gas permeable mold allows the employment of solvent including imprinting materials such as compounds and alloy particle.

Paper Details

Date Published: 31 August 2017
PDF: 6 pages
Proc. SPIE 10354, Nanoengineering: Fabrication, Properties, Optics, and Devices XIV, 103541B (31 August 2017); doi: 10.1117/12.2273270
Show Author Affiliations
Shinya Nakajima, Toyama Prefectural Univ. (Japan)
Satoshi Takei, Toyama Prefectural Univ. (Japan)
Makoto Hanabata, Toyama Prefectural Univ. (Japan)
Naoto Sugino, Sanko Gosei (Japan)
Takao Kameda, Sanko Gosei (Japan)
Yoko Matsumoto, Litho Tech Japan Co. (Japan)
Atsushi Sekiguchi, Litho Tech Japan Co. (Japan)


Published in SPIE Proceedings Vol. 10354:
Nanoengineering: Fabrication, Properties, Optics, and Devices XIV
Eva M. Campo; Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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