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Proceedings Paper

New processes associated with electron-beam lithography for ultra-small resonators
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Paper Abstract

High density ultrahigh resolution patterning with desired shape and size is a crucial requirement in nanotechnology and its applications. Electron beam lithography (EBL) is the most widely used lithography tool for these applications. However, achieving cost-effective patterning with sub-10-nm critical dimension has been challenging due to the inherent tradeoff between resolution and throughput. In this paper, we present cost-effective new processes associated with EBL technique, which include optimized resist selection and processing as well as sonicated cold development process. Using this process, we demonstrate sub-10-nm diameter metal dots at a pitch of ~34 nm and sub-15 nm wide metal lines. Based on the same processes, we demonstrate the fabrication of u-shaped split ring resonator array of different metals with smallest fabricated resonator with ~60 nm size and v-shape SRRs with the smallest gap spacing of ~30 nm. By adjusting the SRR gap spacing through its arm length and opening angle, we have successfully demonstrated magnetic and electric resonances across the visible and ultraviolet range.

Paper Details

Date Published: 27 March 2017
PDF: 9 pages
Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101461Q (27 March 2017); doi: 10.1117/12.2272621
Show Author Affiliations
Landobasa Y. M. Tobing, Nanyang Technological Univ. (Singapore)
Dao Hua Zhang, Nanyang Technological Univ. (Singapore)


Published in SPIE Proceedings Vol. 10146:
Advances in Patterning Materials and Processes XXXIV
Christoph K. Hohle, Editor(s)

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