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Proceedings Paper

Advanced method for the characterization of polishing suspensions
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Paper Abstract

The industrial production of components for applications in the area of precision optics has a long-standing tradition in Germany. As in almost all branches of industry, the external circumstances, processes and products have changed over time. Large lots are becoming less frequent and the demand for special components is growing. In order to meet these requirements, it is necessary to adapt the production processes quickly and flexibly. In the field of chemo-mechanical polishing (CMP), this means that in addition to the process parameters such as speed, pressure and feed, the task-specific adaptation of suspension and polishing pad carriers gain in importance. Along with these changes, it is becoming increasingly important to compare and evaluate the properties of the various polishing suspensions. The procedures according to DIN 58750-3 and DIN 58750-4 are suitable for this purpose. Due to the clearly defined procedures and the constant boundary conditions, different suspensions can be compared and evaluated.

The study presented here shows that this method can also lead to misinterpretations. Known relationships, such as the influence of the polishing pad, the concentration of the suspension and the influence of the processed materials play an important role. An extension of the procedure of DIN 58750-3 for the test of a polishing agent can help in a task-specific characterization of polishing slurries.

Paper Details

Date Published: 15 June 2017
PDF: 8 pages
Proc. SPIE 10326, Fourth European Seminar on Precision Optics Manufacturing, 103260I (15 June 2017); doi: 10.1117/12.2272431
Show Author Affiliations
Christian J. Trum, Deggendorf Institute of Technology (Germany)
Sebastian Sitzberger, Deggendorf Institute of Technology (Germany)
Rolf Rascher, Deggendorf Institute of Technology (Germany)

Published in SPIE Proceedings Vol. 10326:
Fourth European Seminar on Precision Optics Manufacturing
Oliver W. Fähnle; Rolf Rascher; Christine Wünsche, Editor(s)

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