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Proceedings Paper

Large area of MCP electronic rinse system design
Author(s): Yafeng Qiu; Zhigang Yan; Chengxin Song
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Paper Abstract

Based on the study of the current technology of MCP electron rinse and parameters testing, a new electron rinse and testing system with four working stations for large area MCP is developed. In this system, electron rinse for various large area MCP of diameter less than 100mm can be conducted on each station at the same time, and parameters could be tested at one of the stations in the process of the electron rinse at different stages. Four stations in the vacuum system can be converted to each other quickly and accurately by operating the mechanical transmission structure designed. The system's superior performance was shown by a series of tests and data.

Paper Details

Date Published: 23 August 2017
PDF: 10 pages
Proc. SPIE 10371, Optomechanical Engineering 2017, 103710X (23 August 2017); doi: 10.1117/12.2272228
Show Author Affiliations
Yafeng Qiu, Nanjing Univ. of Science and Technology (China)
Zhigang Yan, Nanjing Univ. of Science and Technology (China)
Chengxin Song, Nanjing Univ. of Science and Technology (China)

Published in SPIE Proceedings Vol. 10371:
Optomechanical Engineering 2017
Alson E. Hatheway; David M. Stubbs, Editor(s)

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