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Proceedings Paper

Lithography lens mounting flexure number design and aberration analysis
Author(s): Ming-Ying Hsu; Shenq-Tsong Chang; Ting-Ming Huang
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Paper Abstract

The refraction lithography lens has many units, which are easily deformed by gravity forces. However, the lens mount flexure design can relieve lens surface gravity deformation. The lithography lens generically has more than 10 lens units, so with each unit, the gravity deformation sum will create large aberrations in the system. The flexure number can generate a relative aberration, such as trefoil, tetrafoil, and high-order aberrations. In addition, the lens flexure orientation can compensate for non-symmetric to symmetric aberrations from effects of gravity deformation. Thus, symmetric aberrations must resist magnitude in one or two lens units through the measurement data. This study attempts to calculate and predict lens gravity deformation; the results can assist with optical design and reoptimize system performance, as well as reduce the rework risk by measurement data.

Paper Details

Date Published: 23 August 2017
PDF: 8 pages
Proc. SPIE 10371, Optomechanical Engineering 2017, 103710F (23 August 2017); doi: 10.1117/12.2272104
Show Author Affiliations
Ming-Ying Hsu, Instrument Technology Research Ctr. (Taiwan)
Shenq-Tsong Chang, Instrument Technology Research Ctr. (Taiwan)
Ting-Ming Huang, Instrument Technology Research Ctr. (Taiwan)

Published in SPIE Proceedings Vol. 10371:
Optomechanical Engineering 2017
Alson E. Hatheway; David M. Stubbs, Editor(s)

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