
Proceedings Paper
The end-to-end simulator for the E-ELT HIRES high resolution spectrographFormat | Member Price | Non-Member Price |
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Paper Abstract
We present the design, architecture and results of the End-to-End simulator model of the high resolution spectrograph
HIRES for the European Extremely Large Telescope (E-ELT). This system can be used as a tool to characterize the
spectrograph both by engineers and scientists. The model allows to simulate the behavior of photons starting from the
scientific object (modeled bearing in mind the main science drivers) to the detector, considering also calibration light
sources, and allowing to perform evaluation of the different parameters of the spectrograph design. In this paper, we will
detail the architecture of the simulator and the computational model which are strongly characterized by modularity and
flexibility that will be crucial in the next generation astronomical observation projects like E-ELT due to of the high
complexity and long-time design and development. Finally, we present synthetic images obtained with the current
version of the End-to-End simulator based on the E-ELT HIRES requirements (especially high radial velocity accuracy).
Once ingested in the Data reduction Software (DRS), they will allow to verify that the instrument design can achieve the
radial velocity accuracy needed by the HIRES science cases.
Paper Details
Date Published: 26 June 2017
PDF: 13 pages
Proc. SPIE 10329, Optical Measurement Systems for Industrial Inspection X, 103290Z (26 June 2017); doi: 10.1117/12.2271953
Published in SPIE Proceedings Vol. 10329:
Optical Measurement Systems for Industrial Inspection X
Peter Lehmann; Wolfgang Osten; Armando Albertazzi Gonçalves Jr., Editor(s)
PDF: 13 pages
Proc. SPIE 10329, Optical Measurement Systems for Industrial Inspection X, 103290Z (26 June 2017); doi: 10.1117/12.2271953
Show Author Affiliations
M. Genoni, Univ. degli Studi dell' Insubria (Italy)
INAF - Osservatorio Astronomico di Brera (Italy)
M. Landoni, INAF - Osservatorio Astronomico di Brera (Italy)
M. Riva, INAF - Osservatorio Astronomico di Brera (Italy)
G. Pariani, INAF - Osservatorio Astronomico di Brera (Italy)
E. Mason, INAF - Osservatorio Astronomico di Trieste (Italy)
P. Di Marcantonio, INAF - Osservatorio Astronomico di Trieste (Italy)
INAF - Osservatorio Astronomico di Brera (Italy)
M. Landoni, INAF - Osservatorio Astronomico di Brera (Italy)
M. Riva, INAF - Osservatorio Astronomico di Brera (Italy)
G. Pariani, INAF - Osservatorio Astronomico di Brera (Italy)
E. Mason, INAF - Osservatorio Astronomico di Trieste (Italy)
P. Di Marcantonio, INAF - Osservatorio Astronomico di Trieste (Italy)
K. Disseau, Georg-August-Univ. Göttingen (Germany)
I. Di Varano, Leibniz-Institut für Astrophysik Potsdam (Germany)
O. Gonzalez, UK Astronomy Technology Ctr. (United Kingdom)
P. Huke, Georg-August-Univ. Göttingen (Germany)
H. Korhonen, Niels Bohr Institute (Denmark)
Gianluca Li Causi, INAF - Istituto di Astrofisica e Planetologia Spaziali (Italy)
I. Di Varano, Leibniz-Institut für Astrophysik Potsdam (Germany)
O. Gonzalez, UK Astronomy Technology Ctr. (United Kingdom)
P. Huke, Georg-August-Univ. Göttingen (Germany)
H. Korhonen, Niels Bohr Institute (Denmark)
Gianluca Li Causi, INAF - Istituto di Astrofisica e Planetologia Spaziali (Italy)
Published in SPIE Proceedings Vol. 10329:
Optical Measurement Systems for Industrial Inspection X
Peter Lehmann; Wolfgang Osten; Armando Albertazzi Gonçalves Jr., Editor(s)
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