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Proceedings Paper

Application of the graphics processor unit to simulate a near field diffraction
Author(s): Alexander A. Zinchik; Oleg K. Topalov; Yana B. Muzychenko
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Paper Abstract

For many years, computer modeling program used for lecture demonstrations. Most of the existing commercial software, such as Virtual Lab, LightTrans GmbH company are quite expensive and have a surplus capabilities for educational tasks. The complexity of the diffraction demonstrations in the near zone, due to the large amount of calculations required to obtain the two-dimensional distribution of the amplitude and phase. At this day, there are no demonstrations, allowing to show the resulting distribution of amplitude and phase without much time delay. Even when using Fast Fourier Transform (FFT) algorithms diffraction calculation speed in the near zone for the input complex amplitude distributions with size more than 2000 × 2000 pixels is tens of seconds. Our program selects the appropriate propagation operator from a prescribed set of operators including Spectrum of Plane Waves propagation and Rayleigh-Sommerfeld propagation (using convolution). After implementation, we make a comparison between the calculation time for the near field diffraction: calculations made on GPU and CPU, showing that using GPU for calculations diffraction pattern in near zone does increase the overall speed of algorithm for an image of size 2048×2048 sampling points and more. The modules are implemented as separate dynamic-link libraries and can be used for lecture demonstrations, workshops, selfstudy and students in solving various problems such as the phase retrieval task.

Paper Details

Date Published: 26 June 2017
PDF: 6 pages
Proc. SPIE 10330, Modeling Aspects in Optical Metrology VI, 103301O (26 June 2017); doi: 10.1117/12.2270293
Show Author Affiliations
Alexander A. Zinchik, ITMO Univ. (Russian Federation)
Oleg K. Topalov, ITMO Univ. (Russian Federation)
Yana B. Muzychenko, ITMO Univ. (Russian Federation)

Published in SPIE Proceedings Vol. 10330:
Modeling Aspects in Optical Metrology VI
Bernd Bodermann; Karsten Frenner; Richard M. Silver, Editor(s)

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