
Proceedings Paper
Structural influence of a spatial light modulator on generated wavefronts for speckle-based shape measurementFormat | Member Price | Non-Member Price |
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Paper Abstract
The inspection of technical surfaces is often performed by two-wavelength electronic speckle-pattern interferometry (ESPI) combined with a phase-shifting procedure. As in conventional specular interferometry, the characteristic fringe spacing in the generated interferogram is defined by the applied wavelengths and the sensitivity is therefore constant in one fringe pattern. Subsequently, this technique is limited to surface structures with similar phase gradients and low structural density. To measure more complex structures, a high-resolution generated reference wavefront (HRGW) is adapted to the measurement object for local sensitivity adaption. The feasibility of this principle is directly linked to the functionality of the used spatial light modulator (SLM). A key factor of a proper phase-control is the structural setup of the SLM. In this article, the general influence of the microstructure of SLMs in adaptive ESPI is evaluated.
Paper Details
Date Published: 26 June 2017
PDF: 12 pages
Proc. SPIE 10334, Automated Visual Inspection and Machine Vision II, 1033403 (26 June 2017); doi: 10.1117/12.2269453
Published in SPIE Proceedings Vol. 10334:
Automated Visual Inspection and Machine Vision II
Jürgen Beyerer; Fernando Puente León, Editor(s)
PDF: 12 pages
Proc. SPIE 10334, Automated Visual Inspection and Machine Vision II, 1033403 (26 June 2017); doi: 10.1117/12.2269453
Show Author Affiliations
Laura Aulbach, Technische Univ. München (Germany)
Félix Salazar Bloise, Univ. Politécnica de Madrid (Spain)
Min Lu, Technische Univ. München (Germany)
Félix Salazar Bloise, Univ. Politécnica de Madrid (Spain)
Min Lu, Technische Univ. München (Germany)
Shengjia Wang, Technische Univ. München (Germany)
Alexander W. Koch, Technische Univ. München (Germany)
Alexander W. Koch, Technische Univ. München (Germany)
Published in SPIE Proceedings Vol. 10334:
Automated Visual Inspection and Machine Vision II
Jürgen Beyerer; Fernando Puente León, Editor(s)
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