Share Email Print

Proceedings Paper

Low-pressure RF remote plasma cleaning of carbon-contaminated B4C-coated optics
Author(s): H. Moreno Fernández; M. Thomasset; G. Sauthier; D. Rogler; R. Dietsch; R. Barrett; V. Carlino; E. Pellegrin
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Boron carbide (B4C) - due to its exceptional mechanical properties - is one of the few existing materials that can withstand the extremely high brilliance of the photon beam from free electron lasers (FELs) and is thus of considerable interest for optical applications in this field. However, as in the case of many other optics operated at modern accelerator-, plasma-, or laser-based light source facilities, B4C-coated optics are subject to ubiquitous carbon contaminations. These contaminations - that are presumably produced via cracking of CHx and CO2 molecules by photoelectrons emitted from the optical components - represent a serious issue for the operation of the pertinent high performance beamlines due to a severe reduction of photon flux and beam coherence, not necessarily restricted to the photon energy range of the carbon K-edge. Thus, a variety of B4C cleaning technologies have been developed at different laboratories with varying success [1]. Here, we present a study regarding the low-pressure RF plasma cleaning of a series of carbon-contaminated B4C test samples via an inductively coupled O2/Ar and Ar/H2 remote RF plasma produced using the IBSS GV10x plasma source following previous studies using the same RF plasma source [2, 3]. Results regarding the chemistry, morphology as well as other aspects of the B4C optical coatings and surfaces before and after the plasma cleaning process are reported.

Paper Details

Date Published: 15 May 2017
PDF: 8 pages
Proc. SPIE 10236, Damage to VUV, EUV, and X-ray Optics VI, 102360E (15 May 2017); doi: 10.1117/12.2269374
Show Author Affiliations
H. Moreno Fernández, CELLS - ALBA (Spain)
M. Thomasset, Synchrotron SOLEIL (France)
G. Sauthier, Institut Català de Nanociència i Nanotecnologia (ICN2) (Spain)
D. Rogler, AXO DRESDEN GmbH (Germany)
R. Dietsch, AXO DRESDEN GmbH (Germany)
R. Barrett, ESRF - The European Synchrotron (France)
V. Carlino, ibss Group, Inc. (United States)
E. Pellegrin, CELLS - ALBA (Spain)

Published in SPIE Proceedings Vol. 10236:
Damage to VUV, EUV, and X-ray Optics VI
Libor Juha; Saša Bajt; Regina Soufli, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?