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Proceedings Paper

Growth of nano-dots on the grazing incidence mirror surface under FEL irradiation: analytic approach to modeling
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Paper Abstract

Simple analytic equation is deduced to explain new physical phenomenon detected experimentally: growth of nano-dots (40–55 nm diameter, 8–13 nm height, 9.4 dots/μm2 surface density) on the grazing incidence mirror surface under the three years irradiation by the free electron laser FLASH (5–45 nm wavelength, 3 degrees grazing incidence angle). The growth model is based on the assumption that the growth of nano-dots is caused by polymerization of incoming hydrocarbon molecules under the action of incident photons directly or photoelectrons knocked out from a mirror surface. The key feature of our approach consists in that we take into account the radiation intensity variation nearby a mirror surface in an explicit form, because the polymerization probability is proportional to it. We demonstrate that the simple analytic approach allows to explain all phenomena observed in experiment and to predict new effects. In particular, we show that the nano-dots growth depends crucially on the grazing angle of incoming beam and its intensity: growth of nano-dots is observed in the limited from above and below intervals of the grazing angle and the radiation intensity. Decrease in the grazing angle by 1 degree only (from 3 to 2 degree) may result in a strong suppression of nanodots growth and their total disappearing. Similarly, decrease in the radiation intensity by several times (replacement of free electron laser by synchrotron) results also in disappearing of nano-dots growth.

Paper Details

Date Published: 15 May 2017
PDF: 7 pages
Proc. SPIE 10236, Damage to VUV, EUV, and X-ray Optics VI, 102360D (15 May 2017); doi: 10.1117/12.2269371
Show Author Affiliations
I. V. Kozhevnikov, A.V. Shubnikov Institute of Crystallography (Russian Federation)
A. V. Buzmakov, A.V. Shubnikov Institute of Crystallography (Russian Federation)
F. Siewert, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (Germany)
K. Tiedtke, Deutsches Elektronen-Synchrotron (Germany)
M. Störmer, Helmholtz-Zentrum Geesthacht (Germany)
L. Samoylova, European XFEL GmbH (Germany)
H. Sinn, European XFEL GmbH (Germany)


Published in SPIE Proceedings Vol. 10236:
Damage to VUV, EUV, and X-ray Optics VI
Libor Juha; Saša Bajt; Regina Soufli, Editor(s)

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