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Proceedings Paper

Co-integrating plasmonics with Si3N4 photonics towards a generic CMOS compatible PIC platform for high-sensitivity multi-channel biosensors: the H2020 PlasmoFab approach (Conference Presentation) (Withdrawal Notice)
Author(s): Dimitris M. Tsiokos; George Dabos; Dimitra Ketzaki; Jean-Claude Weeber; Laurent Markey; Alain Dereux; Anna Lena Giesecke; Caroline Porschatis; Bartos Chmielak; Thorsten Wahlbrink; Karl Rochracher; Nikos Pleros
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Paper Abstract

Publisher’s Note: This conference presentation, originally published on 14 December 2017, was withdrawn per author request

Silicon photonics meet most fabrication requirements of standard CMOS process lines encompassing the photonics-electronics consolidation vision. Despite this remarkable progress, further miniaturization of PICs for common integration with electronics and for increasing PIC functional density is bounded by the inherent diffraction limit of light imposed by optical waveguides. Instead, Surface Plasmon Polariton (SPP) waveguides can guide light at sub-wavelength scales at the metal surface providing unique light-matter interaction properties, exploiting at the same time their metallic nature to naturally integrate with electronics in high-performance ASPICs.

In this article, we demonstrate the main goals of the recently introduced H2020 project PlasmoFab towards addressing the ever increasing needs for low energy, small size and high performance mass manufactured PICs by developing a revolutionary yet CMOS-compatible fabrication platform for seamless co-integration of plasmonics with photonic and supporting electronic. We demonstrate recent advances on the hosting SiN photonic hosting platform reporting on low-loss passive SiN waveguide and Grating Coupler circuits for both the TM and TE polarization states. We also present experimental results of plasmonic gold thin-film and hybrid slot waveguide configurations that can allow for high-sensitivity sensing, providing also the ongoing activities towards replacing gold with Cu, Al or TiN metal in order to yield the same functionality over a CMOS metallic structure. Finally, the first experimental results on the co-integrated SiN+plasmonic platform are demonstrated, concluding to an initial theoretical performance analysis of the CMOS plasmo-photonic biosensor that has the potential to allow for sensitivities beyond 150000nm/RIU.

Paper Details

Date Published: 7 June 2018
PDF: 1 pages
Proc. SPIE 10249, Integrated Photonics: Materials, Devices, and Applications IV, 1024902 (7 June 2018); doi: 10.1117/12.2268881
Show Author Affiliations
Dimitris M. Tsiokos, Aristotle Univ. of Thessaloniki (Greece)
George Dabos, Aristotle Univ. of Thessaloniki (Greece)
Dimitra Ketzaki, Aristotle Univ. of Thessaloniki (Greece)
Jean-Claude Weeber, Lab. Interdisciplinaire Carnot de Bourgogne (France)
Laurent Markey, Lab. Interdisciplinaire Carnot de Bourgogne (France)
Alain Dereux, Lab. Interdisciplinaire Carnot de Bourgogne (France)
Anna Lena Giesecke, AMO GmbH (Germany)
Caroline Porschatis, AMO GmbH (Germany)
Bartos Chmielak, AMO GmbH (Germany)
Thorsten Wahlbrink, AMO GmbH (Germany)
Karl Rochracher, ams AG (Austria)
Nikos Pleros, Aristotle Univ. of Thessaloniki (Greece)

Published in SPIE Proceedings Vol. 10249:
Integrated Photonics: Materials, Devices, and Applications IV
Jean-Marc Fédéli; Laurent Vivien, Editor(s)

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