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Proceedings Paper

Analysis method of microstructure surface topography based on wavelet filter
Author(s): Shu Zhang; Yushu Shi; Sitian Gao; Lei Pi; Qi Li; Wei Li; Zhendong Zhu; Shi Li; Lu Huang; Xin Guo
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Paper Abstract

The surface topography of micro-structures would significantly affect the products quality and industrial performance of micro-nano devices [1]. In recent years, the application of micro-structures in Micro Electro Mechanical Systems (MEMS) and integrated circuit is more and more widely. How to reflect the 3D surface topography of these micro structures accurately and measure the surface’s parameters precisely as well as quickly are becoming a hot research area of precision measurement. White-light interference microcopy technology is one of the most widely used non-contacting measurement methods at present, which has the advantages of nondestructive, fast measurement and high accuracy, has been widely applied in surface topography measurement of micro structures. In this paper, an analysis method of microstructure surface topography algorithm based on wavelet filter to analyze white interference signals is proposed, this method utilizes R/G/B three channels color information which is significantly superior to traditional black and white imaging process method. The experimental results shows that this method has good accuracy and repeatability in 3D surface measurement.

Paper Details

Date Published: 5 January 2017
PDF: 7 pages
Proc. SPIE 10244, International Conference on Optoelectronics and Microelectronics Technology and Application, 102441H (5 January 2017); doi: 10.1117/12.2267775
Show Author Affiliations
Shu Zhang, National Institute of Metrology (China)
Yushu Shi, National Institute of Metrology (China)
Tianjin Univ. (China)
Sitian Gao, National Institute of Metrology (China)
Lei Pi, National Institute of Metrology (China)
Qi Li, National Institute of Metrology (China)
Wei Li, National Institute of Metrology (China)
Zhendong Zhu, National Institute of Metrology (China)
Shi Li, National Institute of Metrology (China)
Lu Huang, National Institute of Metrology (China)
Xin Guo, China Jiliang Univ. (China)


Published in SPIE Proceedings Vol. 10244:
International Conference on Optoelectronics and Microelectronics Technology and Application
Shaohua Yu; Jose Capmany; Yi Luo; Yikai Su; Songlin Zhuang; Yue Hao; Akihiko Yoshikawa; Chongjin Xie; Yoshiaki Nakano, Editor(s)

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