
Proceedings Paper
Formation of periodic relief at Sc/Si multilayer surface under EUV laser irradiationFormat | Member Price | Non-Member Price |
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Paper Abstract
By methods of hard X-ray diffraction (λ=0.154 nm) and scanning electron microscopy the surface morphology of Sc/Si multilayer mirrors influenced with nanosecond pulses of discharge capillary laser (λ=46.9 nm) is studied. Under irradiation a relief of periodically alternating valleys and ridges is formed. The region of observed relief is extended over the space being ~104 greater than the irradiated region. Periodic relief (periodicity of 2.2-2.3 μm) appears as a result of reaction between Sc and Si layers making valleys (Sc3Si5 silicide) and ridges (ScSi monosilicide). Each of periods has complex structure exactly repeated in neighbor periods. Mechanisms of periodic relief formation are discussed.
Paper Details
Date Published: 15 May 2017
PDF: 9 pages
Proc. SPIE 10236, Damage to VUV, EUV, and X-ray Optics VI, 102360J (15 May 2017); doi: 10.1117/12.2267292
Published in SPIE Proceedings Vol. 10236:
Damage to VUV, EUV, and X-ray Optics VI
Libor Juha; Saša Bajt; Regina Soufli, Editor(s)
PDF: 9 pages
Proc. SPIE 10236, Damage to VUV, EUV, and X-ray Optics VI, 102360J (15 May 2017); doi: 10.1117/12.2267292
Show Author Affiliations
Y. P. Pershyn, National Technical Univ. (Ukraine)
A. Zolotaryov, Institute of Applied Physics (Germany)
J. J. Rocca, Colorado State Univ. (United States)
A. Y. Devizenko, National Technical Univ. (Ukraine)
A. Zolotaryov, Institute of Applied Physics (Germany)
J. J. Rocca, Colorado State Univ. (United States)
A. Y. Devizenko, National Technical Univ. (Ukraine)
V. V. Kondratenko, National Technical Univ. (Ukraine)
I. A. Artyukov, P.N. Lebedev Physical Institute (Russian Federation)
A. V. Vinogradov, P.N. Lebedev Physical Institute (Russian Federation)
I. A. Artyukov, P.N. Lebedev Physical Institute (Russian Federation)
A. V. Vinogradov, P.N. Lebedev Physical Institute (Russian Federation)
Published in SPIE Proceedings Vol. 10236:
Damage to VUV, EUV, and X-ray Optics VI
Libor Juha; Saša Bajt; Regina Soufli, Editor(s)
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