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Proceedings Paper

Investigation of the phase formation from nickel coated nanostructured silicon
Author(s): Yulia I. Shilyaeva; Olga V. Pyatilova; Alexandra Yu. Berezkina; Artem V. Sysa; Alexander A. Dudin; Dmitry I. Smirnov; Sergey A. Gavrilov
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Paper Abstract

In this paper, the influence of the conditions of chemical and electrochemical nickel plating of nanostructured silicon and subsequent heat treatment on the phase composition of Si/Ni structures with advanced interface is studied. Nanostructured silicon formed by chemical and electrochemical etching was used for the formation of a developed interphase surface. The resulting Si/Ni samples were analyzed using scanning electron microscopy, energy dispersive X-ray analysis, and X-ray phase analysis. The experiments have revealed the differences in phase composition of the Si/Ni structures obtained by different methods, both before and after heat treatment.

Paper Details

Date Published: 30 December 2016
PDF: 5 pages
Proc. SPIE 10224, International Conference on Micro- and Nano-Electronics 2016, 102240E (30 December 2016); doi: 10.1117/12.2264593
Show Author Affiliations
Yulia I. Shilyaeva, National Research Univ. of Electronic Technology (Russian Federation)
Olga V. Pyatilova, National Research Univ. of Electronic Technology (Russian Federation)
Alexandra Yu. Berezkina, National Research Univ. of Electronic Technology (Russian Federation)
Artem V. Sysa, National Research Univ. of Electronic Technology (Russian Federation)
Alexander A. Dudin, Institute of Nanotechnology Microelectronics (Russian Federation)
Dmitry I. Smirnov, National Research Univ. of Electronic Technology (Russian Federation)
Lebedev Physical Institute (Russian Federation)
Sergey A. Gavrilov, National Research Univ. of Electronic Technology (Russian Federation)


Published in SPIE Proceedings Vol. 10224:
International Conference on Micro- and Nano-Electronics 2016
Vladimir F. Lukichev; Konstantin V. Rudenko, Editor(s)

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