Proceedings Paper
Low-frequency roughness mitigation on N7/N5 fin patterning (Conference Presentation)
Paper Abstract
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Paper Details
Date Published: 27 April 2017
PDF: 1 pages
Proc. SPIE 10149, Advanced Etch Technology for Nanopatterning VI, 101490A (27 April 2017); doi: 10.1117/12.2263468
Published in SPIE Proceedings Vol. 10149:
Advanced Etch Technology for Nanopatterning VI
Sebastian U. Engelmann, Editor(s)
PDF: 1 pages
Proc. SPIE 10149, Advanced Etch Technology for Nanopatterning VI, 101490A (27 April 2017); doi: 10.1117/12.2263468
Show Author Affiliations
Efrain Altamirano-Sánchez, IMEC (Belgium)
Published in SPIE Proceedings Vol. 10149:
Advanced Etch Technology for Nanopatterning VI
Sebastian U. Engelmann, Editor(s)
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