Proceedings Paper
Noise reduction in an optical emission spectrometer with rotating diffraction grating| Format | Member Price | Non-Member Price |
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Paper Abstract
The paper concerns the development of an optical emission spectrometer with a helium microwave rotating plasma as the excitation source which is an alternative to ICP spectrometers. In the new solution helium is used as the plasma and carrier gases, which helps to determine elements such as halogens and some non-metals. The new system should demonstrate decreased operating costs i.e. the flow of 1L He/min compared to about 15L Ar/min for ICP. Its spectral range is within 165 nm - 840 nm, sensitivity at the level of ppb and spectral resolution is equal to 0.01 nm. The system uses a set of two photomultipliers for VIS and UV regions. The entire spectrum is collected during a single rotation of the diffraction gratings. The paper describes the collection of algorithms developed to decrease noise and smooth spectral data.
Paper Details
Date Published: 23 December 2016
PDF: 7 pages
Proc. SPIE 10142, 20th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 101421Q (23 December 2016); doi: 10.1117/12.2263230
Published in SPIE Proceedings Vol. 10142:
20th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics
Jarmila Müllerová; Dagmar Senderáková; Libor Ladányi; Ľubomír Scholtz, Editor(s)
PDF: 7 pages
Proc. SPIE 10142, 20th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 101421Q (23 December 2016); doi: 10.1117/12.2263230
Show Author Affiliations
Dariusz Litwin, Maksymilian Pluta Institute of Applied Optics (Poland)
Stefan Sitarek, Maksymilian Pluta Institute of Applied Optics (Poland)
Anna Tyburska-Staniewska, Maksymilian Pluta Institute of Applied Optics (Poland)
Andrzej Ramsza, Maksymilian Pluta Institute of Applied Optics (Poland)
Piotr Wikliński, Maksymilian Pluta Institute of Applied Optics (Poland)
Henryk A. Kowalski, Warsaw Univ. of Technology (Poland)
Stefan Sitarek, Maksymilian Pluta Institute of Applied Optics (Poland)
Anna Tyburska-Staniewska, Maksymilian Pluta Institute of Applied Optics (Poland)
Andrzej Ramsza, Maksymilian Pluta Institute of Applied Optics (Poland)
Piotr Wikliński, Maksymilian Pluta Institute of Applied Optics (Poland)
Henryk A. Kowalski, Warsaw Univ. of Technology (Poland)
Grzegorz Mazur, Warsaw Univ. of Technology (Poland)
Janusz Rzeszut, Warsaw Univ. of Technology (Poland)
Łukasz Dałek, Warsaw Univ. of Technology (Poland)
Jacek Galas, Maksymilian Pluta Institute of Applied Optics (Poland)
Marek Daszkiewicz, Maksymilian Pluta Institute of Applied Optics (Poland)
Janusz Rzeszut, Warsaw Univ. of Technology (Poland)
Łukasz Dałek, Warsaw Univ. of Technology (Poland)
Jacek Galas, Maksymilian Pluta Institute of Applied Optics (Poland)
Marek Daszkiewicz, Maksymilian Pluta Institute of Applied Optics (Poland)
Published in SPIE Proceedings Vol. 10142:
20th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics
Jarmila Müllerová; Dagmar Senderáková; Libor Ladányi; Ľubomír Scholtz, Editor(s)
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