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Proceedings Paper

Epitaxial lift-off technology of GaAs multijunction solar cells
Author(s): P. Knyps; E. Dumiszewska; W. Kaszub; A. Przewłoka; W. Strupinski
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Paper Abstract

Epitaxial lift-off (ELO) is a process which enables the removal of solar cell structures (one junction GaAs, two junction GaAs/InGaP or three junction GaAs/InGaAs/InGaP) from the substrate on which they are grown and their transfer onto lightweight carriers such as metal or polymeric insulator films. The said solar cells exhibit superior power conversion efficiency compared with alternative single-junction photovoltaic cell designs such as those based on crystalline Si, copper indium gallium sulfide (CIGS) or CdTe. The major advantage of ELO solar cells is the potential for wafer reuse, which can enable significant manufacturing cost reduction by minimizing the consumption of expensive wafers. Here in this work we have grown one junction GaAs solar cells on GaAs (100) substrates. A 10 nm thick AlAs layer has been used as a release layer, which has been selectively etched in HF solution. We have investigated different methods of transferring thin films onto polymer and copper foils, including the usage of temporary mounting adhesives and electro-conductive pastes. Lift-off has been demonstrated to be a very promising technique for producing affordable solar cells with a very high efficiency of up to 30%.

Paper Details

Date Published: 22 December 2016
PDF: 4 pages
Proc. SPIE 10175, Electron Technology Conference 2016, 1017518 (22 December 2016); doi: 10.1117/12.2263185
Show Author Affiliations
P. Knyps, Institute of Electronic Materials Technology (Poland)
E. Dumiszewska, Institute of Electronic Materials Technology (Poland)
W. Kaszub, Institute of Electronic Materials Technology (Poland)
A. Przewłoka, Institute of Electronic Materials Technology (Poland)
W. Strupinski, Institute of Electronic Materials Technology (Poland)

Published in SPIE Proceedings Vol. 10175:
Electron Technology Conference 2016
Barbara Swatowska; Wojciech Maziarz; Tadeusz Pisarkiewicz; Wojciech Kucewicz, Editor(s)

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