We demonstrate two different approaches of implementing design technology co-optimization (DTCO). One is on optimizing standard cells. Before being placed on mask, standard cells can be evaluated and optimized to gain better process windows. This approach enables an additional learning cycle before mask tapeout, reducing process development cost. The other approach uses a random pattern generator to create various patterns with high coverage based on given design rules. Lithography simulation is used to evaluate process window of these patterns, and annotates its printability. Test patterns generated in this way can be used for early process development.

Date Published: 4 April 2017
PDF: 7 pages
Proc. SPIE 10148, Design-Process-Technology Co-optimization for Manufacturability XI, 101481G (4 April 2017); doi: 10.1117/12.2263178

Published in SPIE Proceedings Vol. 10148:
Design-Process-Technology Co-optimization for Manufacturability XI
Luigi Capodieci; Jason P. Cain, Editor(s)