Proceedings Paper
Diffraction optical elements with deep phase profile obtained with the use of x-ray parallel intensive beam| Format | Member Price | Non-Member Price |
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Paper Abstract
X-ray lithography with synchrotron radiation was applied for formation of the Fresnel zone structure profile onto a curved surface of a refractive polymer lens to achieve multifocus properties of the lens. First prototypes of the hybrid refractive-diffractive lens were fabricated in such a way and their optical properties were investigated. Some possibilities for creation of diffraction apochromatic optical elements are considered as well.
Paper Details
Date Published: 3 November 1995
PDF: 6 pages
Proc. SPIE 2648, International Conference on Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics, (3 November 1995);
Published in SPIE Proceedings Vol. 2648:
International Conference on Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics
Sergey V. Svechnikov; Mikhail Ya. Valakh, Editor(s)
PDF: 6 pages
Proc. SPIE 2648, International Conference on Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics, (3 November 1995);
Show Author Affiliations
Voldemar Petrovich Koronkevich, Institute of Automation and Electrometry (Russia)
G. N. Kulipanov, Budker Institute of Nuclear Physics (Russia)
Oleg A. Makarov, Budker Institute of Nuclear Physics (Russia)
G. N. Kulipanov, Budker Institute of Nuclear Physics (Russia)
Oleg A. Makarov, Budker Institute of Nuclear Physics (Russia)
Vladimir Nazmov, Budker Institute of Nuclear Physics (Russia)
Valery F. Pindyurin, Budker Institute of Nuclear Physics (Russia)
M. P. Sinyukov, Institute of Semiconductor Physics (Russia)
Valery F. Pindyurin, Budker Institute of Nuclear Physics (Russia)
M. P. Sinyukov, Institute of Semiconductor Physics (Russia)
Published in SPIE Proceedings Vol. 2648:
International Conference on Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics
Sergey V. Svechnikov; Mikhail Ya. Valakh, Editor(s)
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