In this work, we report the technology of infrared photodetectors based on graphene layers (GLs). In the course of this work the new set of photolithography masks was especially designed to fabricate test structures. The new masks-set contains a matrix of different types of photodetector structures with varied active area dimensions, as well as additional module for characterization of electro-physical parameters of graphene and graphene-based devices. After careful optimization of consecutive technological steps, test structures were fabricated. First results of electrical characterization of obtained graphene-based photodetectors demonstrated that the developed technology was successful, however, further detailed optical characterization towards sensing parameters and potential applications in infrared detectors is necessary.

Date Published: 22 December 2016
PDF: 7 pages
Proc. SPIE 10175, Electron Technology Conference 2016, 101750U (22 December 2016); doi: 10.1117/12.2261659

Published in SPIE Proceedings Vol. 10175:
Electron Technology Conference 2016
Barbara Swatowska; Wojciech Maziarz; Tadeusz Pisarkiewicz; Wojciech Kucewicz, Editor(s)