This talk will describe computational imaging methods for phase retrieval of mask effects, such as electromagnetic edge effects. Our experimental setups employ illumination-side or detection-side coding of angle (Fourier) space with simple hardware. The result is high-resolution intensity and phase images for quantifying mask edge effects. We describe methods for illumination coding Gigapixel microscopy in commercial microscopes and extend our methods to 3D imaging and algorithmic self-calibration. Through an end-to-end design of both the optical system and the computational algorithms, we achieve metrology modalities that are accurate, simple and flexible.

Date Published: 26 April 2017
PDF: 1 pages
Proc. SPIE 10147, Optical Microlithography XXX, 1014708 (26 April 2017); doi: 10.1117/12.2261296

Published in SPIE Proceedings Vol. 10147:
Optical Microlithography XXX
Andreas Erdmann; Jongwook Kye, Editor(s)