Share Email Print

Proceedings Paper

The future of EUV lithography: enabling Moore's Law in the next decade
Author(s): Alberto Pirati; Jan van Schoot; Kars Troost; Rob van Ballegoij; Peter Krabbendam; Judon Stoeldraijer; Erik Loopstra; Jos Benschop; Jo Finders; Hans Meiling; Eelco van Setten; Niclas Mika; Jeannot Dredonx; Uwe Stamm; Bernhard Kneer; Bernd Thuering; Winfried Kaiser; Tilmann Heil; Sascha Migura
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

While EUV systems equipped with a 0.33 Numerical Aperture lenses are readying to start volume manufacturing, ASML and Zeiss are ramping up their development activities on a EUV exposure tool with Numerical Aperture greater than 0.5. The purpose of this scanner, targeting a resolution of 8nm, is to extend Moore’s law throughout the next decade.

A novel, anamorphic lens design, has been developed to provide the required Numerical Aperture; this lens will be paired with new, faster stages and more accurate sensors enabling Moore’s law economical requirements, as well as the tight focus and overlay control needed for future process nodes.

The tighter focus and overlay control budgets, as well as the anamorphic optics, will drive innovations in the imaging and OPC modelling, and possibly in the metrology concepts.

Furthermore, advances in resist and mask technology will be required to image lithography features with less than 10nm resolution.

This paper presents an overview of the key technology innovations and infrastructure requirements for the next generation EUV systems.

Paper Details

Date Published: 27 March 2017
PDF: 16 pages
Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 101430G (27 March 2017); doi: 10.1117/12.2261079
Show Author Affiliations
Alberto Pirati, ASML Netherlands B.V. (Netherlands)
Jan van Schoot, ASML Netherlands B.V. (Netherlands)
Kars Troost, ASML Netherlands B.V. (Netherlands)
Rob van Ballegoij, ASML Netherlands B.V. (Netherlands)
Peter Krabbendam, ASML Netherlands B.V. (Netherlands)
Judon Stoeldraijer, ASML Netherlands B.V. (Netherlands)
Erik Loopstra, ASML Netherlands B.V. (Netherlands)
Jos Benschop, ASML Netherlands B.V. (Netherlands)
Jo Finders, ASML Netherlands B.V. (Netherlands)
Hans Meiling, ASML Netherlands B.V. (Netherlands)
Eelco van Setten, ASML Netherlands B.V. (Netherlands)
Niclas Mika, ASML Netherlands B.V. (Netherlands)
Jeannot Dredonx, ASML Netherlands B.V. (Netherlands)
Uwe Stamm, ASML Netherlands B.V. (Netherlands)
Bernhard Kneer, Carl Zeiss SMT GmbH (Germany)
Bernd Thuering, Carl Zeiss SMT GmbH (Germany)
Winfried Kaiser, Carl Zeiss SMT GmbH (Germany)
Tilmann Heil, Carl Zeiss SMT GmbH (Germany)
Sascha Migura, Carl Zeiss SMT GmbH (Germany)

Published in SPIE Proceedings Vol. 10143:
Extreme Ultraviolet (EUV) Lithography VIII
Eric M. Panning, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?