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Proceedings Paper

A pattern-based method to automate mask inspection files
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Paper Abstract

Mask inspection is a critical step in the mask manufacturing process in order to ensure all dimensions printed are within the needed tolerances. This becomes even more challenging as the device nodes shrink and the complexity of the tapeout increases. Thus, the amount of measurement points and their critical dimension (CD) types are increasing to ensure the quality of the mask. In addition to the mask quality, there is a significant amount of manpower needed when the preparation and debugging of this process are not automated. By utilizing a novel pattern search technology with the ability to measure and report match region scan-line (edge) measurements, we can create a flow to find, measure and mark all metrology locations of interest and provide this automated report to the mask shop for inspection. A digital library is created based on the technology product and node which contains the test patterns to be measured. This paper will discuss how these digital libraries will be generated and then utilized. As a time-critical part of the manufacturing process, this can also reduce the data preparation cycle time, minimize the amount of manual/human error in naming and measuring the various locations, reduce the risk of wrong/missing CD locations, and reduce the amount of manpower needed overall. We will also review an example pattern and how the reporting structure to the mask shop can be processed. This entire process can now be fully automated.

Paper Details

Date Published: 28 March 2017
PDF: 9 pages
Proc. SPIE 10145, Metrology, Inspection, and Process Control for Microlithography XXXI, 101452Q (28 March 2017); doi: 10.1117/12.2260976
Show Author Affiliations
Ezni Aznida Binti Kamal Baharin, Silterra Malaysia Sdn. Bhd. (Malaysia)
Mohamad Fahmi Bin Muhsain, Silterra Malaysia Sdn. Bhd. (Malaysia)
Muhamad Asraf Bin Ahmad Ibrahim, Silterra Malaysia Sdn. Bhd. (Malaysia)
Ahmad Nurul Ihsan Bin Ahmad Noorhani, Silterra Malaysia Sdn. Bhd. (Malaysia)
Jason Sweis, Cadence Design Systems, Inc. (United States)
Ya-Chieh Lai, Cadence Design Systems, Inc. (United States)
Philippe Hurat, Cadence Design Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 10145:
Metrology, Inspection, and Process Control for Microlithography XXXI
Martha I. Sanchez, Editor(s)

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