Share Email Print

Proceedings Paper

Effect of charge carrier blocking, surface resistance and electric field distribution on electric field poling of nonlinear optic polymers
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

In our previous work we introduced charge carrier blocking layers to realize an increase in the poling field and, hence, an increase in the nonlinearity, or electro-optic (EO) coefficient, r33, of the nonlinear optic (NLO) polymer disperse red 1:polymethylmethacrylate (DR1:PMMA). In addition, we not only achieved higher poling voltages, which resulted in higher r33s at these higher poling voltages, but we also observed higher r33s when both the samples with and without the charge carrier blocking layers were poled at the same poling voltage. We attributed that primarily to a decrease in the surface resistance. Here we provide a more detailed analysis and propose that the increase may be attributed not only to surface resistance but a combination of lower surface resistance, more uniform electric field distribution and charge carrier blocking, provided by the charge carrier blocking layers.

Paper Details

Date Published: 6 March 2017
PDF: 7 pages
Proc. SPIE 10101, Organic Photonic Materials and Devices XIX, 1010112 (6 March 2017); doi: 10.1117/12.2260596
Show Author Affiliations
Fahima Ouchen, Air Force Research Lab. (United States)
Univ. of Dayton Research Institute (United States)
Emily Heckman, Air Force Research Lab. (United States)
Larry Dalton, Univ. of Washington (United States)
François Kajzar, Univ. Politehnica of Bucharest (Romania)
Ileana Rau, Univ. Politehnica of Bucharest (Romania)
James Grote, Air Force Research Lab. (United States)

Published in SPIE Proceedings Vol. 10101:
Organic Photonic Materials and Devices XIX
Christopher E. Tabor; François Kajzar; Toshikuni Kaino; Yasuhiro Koike, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?