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Proceedings Paper

Advances in DUV light source sustainability
Author(s): Yzzer Roman; Dinesh Kanawade; Walt Gillespie; Siqi Luo; Mark Thever; Thomas Duffey; Kevin O'Brien; Rahul Ahlawat; Andrei Dorobantu; Eric Gross; Eric Mason
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Paper Abstract

Cymer continues to address several areas of sustainability within the semiconductor industry by reducing or eliminating consumption of power and specific types of gas (i.e. neon, helium) required by DUV light sources in order to function. Additionally, Cymer introduced a new recycling technology to reduce the dependence on production of raw gases. In this paper, those initiatives that reduce the operational cost, environmental footprint, and business continuity risk will be discussed.

Cymer has increased the efficiency of its light sources through improvements that have resulted in energy output increase while maintaining the same or requiring less power consumption. For both KrF and ArF systems, there have been component [1], system, and architecture improvements [2] that allowed customers to increase energy efficiency and productivity. An example of module improvements is the latest MO chamber that helped reduce power consumption by ~15%. Future improvements aim to continue reducing the power consumption and cost of operation of the install base and new systems.

The neon supply crisis in 2015 triggered an intensive effort by the lithography light source suppliers to find ways to minimize the use of neon, a main consumable of the light source used in DUV photolithography. Cymer delivered a multi-part support program to reduce natural resource usage, decrease overall cost of operation, and ensure that chipmaker’s business continuity risk is minimized. The methods used to minimize the use of neon for 248 nm and 193 nm photolithography that offered significant relief from supply constraints and reduction of business continuity risk for chipmakers were described in previous work [3]. In this paper, results from the program will be presented.

In addition, techniques to capture the neon effluent and re-purify it within the semiconductor fabs have been pursued. For example, Cymer has developed and validated a neon recycling system for ArF light sources that resides within the chipmaker’s fab. Cymer has partnered with a global gas supplier to develop a system capable of capturing, recycling and delivering <90% of the total neon gas required by multiple ArF light sources through automated operation, including online analysis. In this paper, the neon recycle system performance as demonstrated by a quantitative analysis of facility-supplied gas versus the recycled neon in ArF light source performance will be discussed.

Similarly, DUV light sources have historically used helium as a purge gas in the critical line narrowing module (LNM) to achieve stable wavelength and bandwidth control. Helium has a low coefficient of index of refraction change vs. temperature relative to nitrogen and provides efficient cooling and purging of critical optics in the LNM. Previous work demonstrated how helium consumption can be reduced and still achieve stable performance under all operating conditions [1]. In this paper, results of eliminating the use of helium will be described.

Paper Details

Date Published: 20 June 2017
PDF: 8 pages
Proc. SPIE 10147, Optical Microlithography XXX, 101471Y (20 June 2017); doi: 10.1117/12.2260307
Show Author Affiliations
Yzzer Roman, Cymer LLC (United States)
Dinesh Kanawade, Cymer LLC (United States)
Walt Gillespie, Cymer LLC (United States)
Siqi Luo, Cymer LLC (United States)
Mark Thever, Cymer LLC (United States)
Thomas Duffey, Cymer LLC (United States)
Kevin O'Brien, Cymer LLC (United States)
Rahul Ahlawat, Cymer LLC (United States)
Andrei Dorobantu, Cymer LLC (United States)
Eric Gross, Cymer LLC (United States)
Eric Mason, Cymer LLC (United States)

Published in SPIE Proceedings Vol. 10147:
Optical Microlithography XXX
Andreas Erdmann; Jongwook Kye, Editor(s)

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