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Proceedings Paper

Pattern database applications from design to manufacturing
Author(s): Linda Zhuang; Annie Zhu; Yifan Zhang; Jason Sweis; Ya-Chieh Lai
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Paper Abstract

Pattern-based approaches are becoming more common and popular as the industry moves to advanced technology nodes. At the beginning of a new technology node, a library of process weak point patterns for physical and electrical verification are starting to build up and used to prevent known hotspots from re-occurring on new designs. Then the pattern set is expanded to create test keys for process development in order to verify the manufacturing capability and precheck new tape-out designs for any potential yield detractors. With the database growing, the adoption of pattern-based approaches has expanded from design flows to technology development and then needed for mass-production purposes. This paper will present the complete downstream working flows of a design pattern database(PDB). This pattern-based data analysis flow covers different applications across different functional teams from generating enhancement kits to improving design manufacturability, populating new testing design data based on previous-learning, generating analysis data to improve mass-production efficiency and manufacturing equipment in-line control to check machine status consistency across different fab sites.

Paper Details

Date Published: 30 March 2017
PDF: 8 pages
Proc. SPIE 10148, Design-Process-Technology Co-optimization for Manufacturability XI, 101481F (30 March 2017); doi: 10.1117/12.2259934
Show Author Affiliations
Linda Zhuang, Semiconductor Manufacturing International Corp. (China)
Annie Zhu, Semiconductor Manufacturing International Corp. (China)
Yifan Zhang, Cadence Design Systems, Inc. (United States)
Jason Sweis, Cadence Design Systems, Inc. (United States)
Ya-Chieh Lai, Cadence Design Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 10148:
Design-Process-Technology Co-optimization for Manufacturability XI
Luigi Capodieci; Jason P. Cain, Editor(s)

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