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Proceedings Paper

Layout independent leveling (LIL) on NXT:1980Di immersion scanners for enhanced productivity
Author(s): Bram van Hoof; Arjan Holscher; Ralf Gommers; Jeroen Cottaar; Marcel Raas; Samah Khalek; Jan van Kemenade; Maarten Voncken; Roelof de Graaf; Elliot Oti; Stefan Weichselbaum; Richard Droste; ByeongSoo Lee; Chansam Chang; Young Seog Kang; Young Ha Kim; Jeong-Heung Kong; Jong Hoon Jang; YoungSun Nam; Hyunwoo Hwang
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Paper Abstract

ASML’s 300mm scanner-systems are built on the TWINSCAN (XT/NXT) platform and yield high productivity levels for dry as well as immersion litho-scanners. NXT:1980Di immersion scanners yield productivity levels as high as 275wph while maintaining the overlay accuracy. The NXT:1980Di can be equipped with a new leveling mode that results in a significant reduction of the time that is spent on measuring the wafer focus height map. In the new leveling mode the focus height map is measured employing the full width of the level sensor and thereby minimizing the number of leveling scans. In this paper we describe the implementation of the LIL-method in the TWINSCAN platform design. Here, we report on the focus / leveling performance for both test as well as customer product wafers, and present a productivity outlook on the performance gain for a selected set of exposure use-cases.

Paper Details

Date Published: 24 March 2017
PDF: 8 pages
Proc. SPIE 10147, Optical Microlithography XXX, 101471A (24 March 2017); doi: 10.1117/12.2259794
Show Author Affiliations
Bram van Hoof, ASML Netherlands B.V. (Netherlands)
Arjan Holscher, ASML Netherlands B.V. (Netherlands)
Ralf Gommers, ASML Netherlands B.V. (Netherlands)
Jeroen Cottaar, ASML Netherlands B.V. (Netherlands)
Marcel Raas, ASML Netherlands B.V. (Netherlands)
Samah Khalek, ASML Netherlands B.V. (Netherlands)
Jan van Kemenade, ASML Netherlands B.V. (Netherlands)
Maarten Voncken, ASML Netherlands B.V. (Netherlands)
Roelof de Graaf, ASML Netherlands B.V. (Netherlands)
Elliot Oti, ASML Netherlands B.V. (Netherlands)
Stefan Weichselbaum, ASML Netherlands B.V. (Netherlands)
Richard Droste, ASML Netherlands B.V. (Netherlands)
ByeongSoo Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Chansam Chang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Young Seog Kang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Young Ha Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jeong-Heung Kong, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jong Hoon Jang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
YoungSun Nam, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hyunwoo Hwang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)

Published in SPIE Proceedings Vol. 10147:
Optical Microlithography XXX
Andreas Erdmann; Jongwook Kye, Editor(s)

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