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Proceedings Paper

Dual brush process for selective surface modification in graphoepitaxy directed self-assembly
Author(s): Jan Doise; Boon Teik Chan; Masafumi Hori; Roel Gronheid
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Paper Abstract

Grapho-epitaxy directed self-assembly is a potential low-cost solution for patterning via layers with pitches beyond the reach of a single optical lithographic exposure. In this process, selective control of the interfacial energy at the bottom and sidewall of the template is an important but challenging exercise. In this work, a dual brush process is implemented, in which two brushes with distinct end-groups are consecutively grafted to the pre-pattern to achieve fully independent modification of the bottom and sidewall surface of the template. A comprehensive study of hole pattern quality shows that using a dual brush process leads to a substantial improvement in terms of positional and dimensional variability across the process window. These findings will be useful to others who wish to manipulate polymer-surface interactions in directed self-assembly flows.

Paper Details

Date Published: 27 March 2017
PDF: 12 pages
Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101460R (27 March 2017); doi: 10.1117/12.2259791
Show Author Affiliations
Jan Doise, KU Leuven (Belgium)
IMEC (Belgium)
Boon Teik Chan, IMEC (Belgium)
Masafumi Hori, JSR Micro N.V. (Belgium)
Roel Gronheid, IMEC (Belgium)


Published in SPIE Proceedings Vol. 10146:
Advances in Patterning Materials and Processes XXXIV
Christoph K. Hohle, Editor(s)

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