Share Email Print

Proceedings Paper

Scaling LPP EUV sources to meet high volume manufacturing requirements (Conference Presentation)

Paper Abstract

In this paper, we provide an overview of various challenges and their solutions for scaling laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source performance to enable high volume manufacturing. We will discuss improvements to source architecture that facilitated the increase of EUV power from 100W to >200W, and the technical challenges for power scaling of key source parameters and subsystems. Finally, we will describe current power-scaling research activities and provide a forward looking perspective for LPP EUV sources towards 500W.

Paper Details

Date Published: 5 May 2017
PDF: 1 pages
Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 101431I (5 May 2017); doi: 10.1117/12.2258628
Show Author Affiliations
Alexander A. Schafgans, Cymer LLC (United States)
Daniel J. Brown, Cymer LLC (United States)
Igor V. Fomenkov, Cymer LLC (United States)
Yezheng Tao, Cymer LLC (United States)
Michael Purvis, Cymer LLC (United States)
Slava I. Rokitski, Cymer LLC (United States)
Georgiy O. Vaschenko, Cymer LLC (United States)
Robert J. Rafac, Cymer LLC (United States)
David C. Brandt, Cymer LLC (United States)

Published in SPIE Proceedings Vol. 10143:
Extreme Ultraviolet (EUV) Lithography VIII
Eric M. Panning, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?