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Proceedings Paper

Designed tools for analysis of lithography patterns and nanostructures
Author(s): Alexandre Dervillé; Julien Baderot; Guilhem Bernard; Johann Foucher; Hanna Grönqvist; Aurélien Labrosse; Sergio Martinez; Yann Zimmermann
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Paper Abstract

We introduce a set of designed tools for the analysis of lithography patterns and nano structures. The classical metrological analysis of these objects has the drawbacks of being time consuming, requiring manual tuning and lacking robustness and user friendliness. With the goal of improving the current situation, we propose new image processing tools at different levels: semi automatic, automatic and machine-learning enhanced tools. The complete set of tools has been integrated into a software platform designed to transform the lab into a virtual fab. The underlying idea is to master nano processes at the research and development level by accelerating the access to knowledge and hence speed up the implementation in product lines.

Paper Details

Date Published: 28 March 2017
PDF: 12 pages
Proc. SPIE 10145, Metrology, Inspection, and Process Control for Microlithography XXXI, 101450I (28 March 2017); doi: 10.1117/12.2258612
Show Author Affiliations
Alexandre Dervillé, POLLEN Metrology (France)
Univ. Grenoble Alpes (France)
Julien Baderot, POLLEN Metrology (France)
Guilhem Bernard, POLLEN Metrology (France)
Johann Foucher, POLLEN Metrology (France)
Hanna Grönqvist, POLLEN Metrology (France)
Aurélien Labrosse, POLLEN Metrology (France)
Sergio Martinez, POLLEN Metrology (France)
Yann Zimmermann, POLLEN Metrology (France)

Published in SPIE Proceedings Vol. 10145:
Metrology, Inspection, and Process Control for Microlithography XXXI
Martha I. Sanchez, Editor(s)

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