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Proceedings Paper

Lab- and field-test results of MFIG, the first real-time vacuum-contamination sensor
Author(s): Diederik Maas; Pim Muilwijk; Michel van Putten; Frank de Graaf; Olaf Kievit; Patrique Boerboom; Norbert B. Koster
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Paper Abstract

To produce high-end semiconductor products, clean vacuum is often required. Even small amounts of high-mass molecules can reduce product yield. The challenge is to timely detect the presence of relevant contaminants. This is where MFIG can help. The mass-filtered ion gauge sensor (MFIG) continuously and selectively monitors the presence of high-mass contaminant molecules with a sensitivity down to 1E-13 mbar at total pressures up to 1E-5 mbar. This contribution presents laboratory and field-test data to demonstrate the capabilities of the latest version of the MFIG sensor in continuously and selectively detecting high-mass contaminant molecules in (U)HV vacuum.

Paper Details

Date Published: 28 March 2017
PDF: 7 pages
Proc. SPIE 10145, Metrology, Inspection, and Process Control for Microlithography XXXI, 101452I (28 March 2017); doi: 10.1117/12.2258230
Show Author Affiliations
Diederik Maas, TNO (Netherlands)
Pim Muilwijk, TNO (Netherlands)
Michel van Putten, TNO (Netherlands)
Frank de Graaf, TNO (Netherlands)
Olaf Kievit, TNO (Netherlands)
Patrique Boerboom, TNO (Netherlands)
Norbert B. Koster, TNO (Netherlands)

Published in SPIE Proceedings Vol. 10145:
Metrology, Inspection, and Process Control for Microlithography XXXI
Martha I. Sanchez, Editor(s)

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