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Proceedings Paper

Irresistible Materials multi-trigger resist: the journey towards high volume manufacturing readiness
Author(s): Warren Montgomery; Alexandra McClelland; David Ure; John Roth; Alex P. G. Robinson
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Paper Abstract

Irresistible Materials (IM) is a UK company spun out of the University of Birmingham. It is developing novel resist systems based on the Multi-trigger concept, and spin-on-carbon hardmask materials. IM has developed a new EUV resist that is nonmetal based, does not need a post exposure bake (PEB), and delivers high sensitivity, excellent contact hole resolution, with low LER. It is being readied for HVM through a partnership with Nano-C, Inc. (the Massachusetts based manufacturer of advanced electronic materials and chemicals). The transition to scalability will be the highlight of this discussion.

Paper Details

Date Published: 24 March 2017
PDF: 13 pages
Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 1014328 (24 March 2017); doi: 10.1117/12.2258092
Show Author Affiliations
Warren Montgomery, Irresistible Materials Ltd. (United Kingdom)
Alexandra McClelland, Irresistible Materials Ltd. (United Kingdom)
David Ure, Irresistible Materials Ltd. (United Kingdom)
John Roth, Nano-C, Inc. (United States)
Alex P. G. Robinson, Irresistible Materials, Ltd. (United Kingdom)
The Univ. of Birmingham (United Kingdom)

Published in SPIE Proceedings Vol. 10143:
Extreme Ultraviolet (EUV) Lithography VIII
Eric M. Panning, Editor(s)

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