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Proceedings Paper

Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner
Author(s): Mark van de Kerkhof; Hans Jasper; Leon Levasier; Rudy Peeters; Roderik van Es; Jan-Willem Bosker; Alexander Zdravkov; Egbert Lenderink; Fabrizio Evangelista; Par Broman; Bartosz Bilski; Thorsten Last
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Paper Abstract

With the introduction of its fifth-generation EUV scanner, the NXE:3400B, ASML has brought EUV to High-Volume Manufacturing for sub-10nm node lithography. This paper presents lithographic performance results obtained with the NXE:3400B, characterized by an NA of 0.33, a Pupil Fill Ratio (PFR) of 0.2 and throughput capability of 125 wafers per hour (or wph).

Advances in source power have enabled a further increase of tool productivity requiring an associated increase of stage scan speeds. To maximize the number of yielding die per day a stringent Overlay, Focus, and Critical Dimension (CD) control is required. Tight CD control at improved resolution is obtained through a number of innovations: the NXE:3400B features lower aberration levels and a revolutionary new illumination system, offering improved pupil-fill ratio and larger sigma range. Overlay and Focus are further improved by implementation of a new wafer clamp and improved scanner controls.

The NXE:3400B also offers full support for reticle pellicles.

Paper Details

Date Published: 24 March 2017
PDF: 14 pages
Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII, 101430D (24 March 2017); doi: 10.1117/12.2258025
Show Author Affiliations
Mark van de Kerkhof, ASML Netherlands B.V. (Netherlands)
Hans Jasper, ASML Netherlands B.V. (Netherlands)
Leon Levasier, ASML Netherlands B.V. (Netherlands)
Rudy Peeters, ASML Netherlands B.V. (Netherlands)
Roderik van Es, ASML Netherlands B.V. (Netherlands)
Jan-Willem Bosker, ASML Netherlands B.V. (Netherlands)
Alexander Zdravkov, ASML Netherlands B.V. (Netherlands)
Egbert Lenderink, ASML Netherlands B.V. (Netherlands)
Fabrizio Evangelista, ASML Netherlands B.V. (Netherlands)
Par Broman, ASML Netherlands B.V. (Netherlands)
Bartosz Bilski, ASML Netherlands B.V. (Netherlands)
Thorsten Last, ASML Netherlands B.V. (Netherlands)

Published in SPIE Proceedings Vol. 10143:
Extreme Ultraviolet (EUV) Lithography VIII
Eric M. Panning, Editor(s)

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