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Proceedings Paper

Fabrication of metrology test structures with helium ion beam direct write
Author(s): Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee
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Paper Abstract

The availability of metrology solutions, one of the key factors to drive leading edge semiconductor devices and processes, can be confronted with difficulties in the advanced node. For developing new metrology solutions, high quality test structures fabricated at specific sizes are needed. Conventional resist-based lithography have been utilized to manufacture such samples. However, it can encounter significant resolution difficulties or requiring complicated optimization process for advanced technology node. In this work, potential of helium ion beam direct milling (HIBDM) for fabricating metrology test structures with programmed imperfection is investigated. Features down to 5 nm are resolvable without implementing any optimization method. Preliminary results have demonstrated that HIBDM can be a promising alternative to fabricate metrology test structures for advanced metrology solutions in sub 10 nm node.

Paper Details

Date Published: 28 March 2017
PDF: 8 pages
Proc. SPIE 10145, Metrology, Inspection, and Process Control for Microlithography XXXI, 1014519 (28 March 2017); doi: 10.1117/12.2257989
Show Author Affiliations
Chien-Lin Lee, National Taiwan Univ. (Taiwan)
Sheng-Wei Chien, National Taiwan Univ. (Taiwan)
Sheng-Yung Chen, National Taiwan Univ. (Taiwan)
Chun-Hung Liu, National Taiwan Univ. (Taiwan)
Kuen-Yu Tsai, National Taiwan Univ. (Taiwan)
Jia-Han Li, National Taiwan Univ. (Taiwan)
Bor-Yuan Shew, National Synchrotron Radiation Research Ctr. (Taiwan)
Chit-Sung Hong, National Synchrotron Radiation Research Ctr. (Taiwan)
Chao-Te Lee, Instrument Technology Research Ctr. (Taiwan)

Published in SPIE Proceedings Vol. 10145:
Metrology, Inspection, and Process Control for Microlithography XXXI
Martha I. Sanchez, Editor(s)

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