Proceedings Paper
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Paper Abstract
Directed Self Assembly (DSA) of block-copolymers (BCPs) used as a complementary technique to the 193nm immersion lithography has demonstrated sub-10nm node applications in both via and line/space patterning. We propose however to study the performance of graphoepitaxy which allows DSA with thicker initial BCP layer, higher multiplication factors and stronger orientation control of lamellae. The aim of this work is to use the 300mm pilot line available at LETI and Arkema’s advanced materials to evaluate the performances of a novel graphoepitaxy process based on the work on a 38nm period lamellar PS-b-PMMA (L38) reported before.
Paper Details
Date Published: 21 March 2017
PDF: 6 pages
Proc. SPIE 10144, Emerging Patterning Technologies, 1014411 (21 March 2017); doi: 10.1117/12.2257969
Published in SPIE Proceedings Vol. 10144:
Emerging Patterning Technologies
Christopher Bencher, Editor(s)
PDF: 6 pages
Proc. SPIE 10144, Emerging Patterning Technologies, 1014411 (21 March 2017); doi: 10.1117/12.2257969
Show Author Affiliations
G. Claveau, CEA-LETI (France)
M. Argoud, CEA-LETI (France)
P. Pimenta-Barros, CEA-LETI (France)
G. Chamiot-Maitral, CEA-LETI (France)
M. Argoud, CEA-LETI (France)
P. Pimenta-Barros, CEA-LETI (France)
G. Chamiot-Maitral, CEA-LETI (France)
Published in SPIE Proceedings Vol. 10144:
Emerging Patterning Technologies
Christopher Bencher, Editor(s)
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