
Proceedings Paper
Challenges and progress in low defectivity for advanced ArF and EUV lithography processes using surface localized material technologyFormat | Member Price | Non-Member Price |
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Paper Abstract
The main challenge in ArF lithography is to reduce cost of ownership (CoO) because increase in multi-patterning process is generally required to obtain a fine pattern. As a consequence, industry strongly requires ArF lithography process with a fast scan speed scanner and low defectivity material for CoO. The breakthrough technology to improve defectivity and resolution simultaneously was the polarity-change property of film surface from hydrophobic to hydrophilic after alkaline development process because a property after development process should be only associated with defectivity, not fast scan speed. The materials with high polarity change function were explored to EUV process to achieve low defectivity with good lithography performances.
Paper Details
Date Published: 27 March 2017
PDF: 8 pages
Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101460E (27 March 2017); doi: 10.1117/12.2257956
Published in SPIE Proceedings Vol. 10146:
Advances in Patterning Materials and Processes XXXIV
Christoph K. Hohle, Editor(s)
PDF: 8 pages
Proc. SPIE 10146, Advances in Patterning Materials and Processes XXXIV, 101460E (27 March 2017); doi: 10.1117/12.2257956
Show Author Affiliations
Michihiro Shirakawa, FUJIFILM Corp. (Japan)
Hideaki Tsubaki, FUJIFILM Corp. (Japan)
Hajime Furutani, FUJIFILM Corp. (Japan)
Wataru Nihashi, FUJIFILM Corp. (Japan)
Naohiro Tango, FUJIFILM Corp. (Japan)
Hideaki Tsubaki, FUJIFILM Corp. (Japan)
Hajime Furutani, FUJIFILM Corp. (Japan)
Wataru Nihashi, FUJIFILM Corp. (Japan)
Naohiro Tango, FUJIFILM Corp. (Japan)
Kazuhiro Marumo, FUJIFILM Corp. (Japan)
Kei Yamamoto, FUJIFILM Corp. (Japan)
Hidenori Takahashi, FUJIFILM Corp. (Japan)
Akiyoshi Goto, FUJIFILM Corp. (Japan)
Mitsuhiro Fujita, FUJIFILM Corp. (Japan)
Kei Yamamoto, FUJIFILM Corp. (Japan)
Hidenori Takahashi, FUJIFILM Corp. (Japan)
Akiyoshi Goto, FUJIFILM Corp. (Japan)
Mitsuhiro Fujita, FUJIFILM Corp. (Japan)
Published in SPIE Proceedings Vol. 10146:
Advances in Patterning Materials and Processes XXXIV
Christoph K. Hohle, Editor(s)
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